Title

A prism coupler technique for characterizing thin film II–VI semiconductor systems

Document Type

Article

Publication Date

10-1998

Abstract

This article has two objectives. First, we determine the indices of refraction n of a series of molecular beam epitaxy-grown Zn1−xCdxSe" role="presentation" style="display: inline; line-height: normal; word-spacing: normal; word-wrap: normal; white-space: nowrap; float: none; direction: ltr; max-width: none; max-height: none; min-width: 0px; min-height: 0px; border: 0px; padding: 0px 2px 0px 0px; margin: 0px; position: relative;">Zn1−xCdxSeZn1−xCdxSe epilayers using a technique based on coupling of evanescent waves via a prism into a semiconductor film. Highly precise values of n" role="presentation" style="display: inline; line-height: normal; word-spacing: normal; word-wrap: normal; white-space: nowrap; float: none; direction: ltr; max-width: none; max-height: none; min-width: 0px; min-height: 0px; border: 0px; padding: 0px 2px 0px 0px; margin: 0px; position: relative;">nn, and their dependence on the alloy composition x" role="presentation" style="display: inline; line-height: normal; word-spacing: normal; word-wrap: normal; white-space: nowrap; float: none; direction: ltr; max-width: none; max-height: none; min-width: 0px; min-height: 0px; border: 0px; padding: 0px 2px 0px 0px; margin: 0px; position: relative;">xx, are obtained for photon energies below the band gap of the alloy material. And second, we use these results to demonstrate the usefulness of the prism coupler method as a very reliable, convenient, and accurate tool for simultaneous determination of composition of semiconductor alloys in thin film form (since n depends on composition), and the film thickness. This method determines the film thickness with typical uncertainty of less than 0.5%.

Journal

Journal of Applied Physics

Volume

84

Issue

5194