Title

Spatially Localized Photoluminescence at 1.5 Micrometers Wavelength in Direct Laser Written Optical Nanostructures

Document Type

Article

Publication Date

11-3-2008

Abstract

A 3D direct laser writing (3D DLW) compatible photoresist, consisting of erbium-doped arsenic trisulfide (Er:As2S3) has been developed. This photoresist simultaneously possess a refractive index (n) of 2.45 and photoluminescence at 1.5 μm wavelength that is also spatially localizable. This enables 3D DLW to produce high-refractive index photonic structures with spatially selective optical activity without the need for post-processing steps.

Journal

Advanced Materials

Volume

20

Issue

21

First Page

4097

Last Page

4102